The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2015
Filed:
Sep. 08, 2010
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Koen Van Ingen Schenau, Veldhoven, NL;
Gosse Charles DE Vries, Veldhoven, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Koen Van Ingen Schenau, Veldhoven, NL;
Gosse Charles De Vries, Veldhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
In a lithographic apparatus, an illumination mode is set using a field mirror comprising a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. In the event that a field facet mirror is defective and cannot be set to a desired position, another of the movable facet mirrors is set to a corrective position, different than its desired position, to at least partially ameliorate a deleterious effect of the defective facet mirror.