The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 2015

Filed:

Dec. 08, 2010
Applicants:

Antonius Theodorus Wilhelmus Kempen, 's-Hertogenbosch, NL;

Richard Joseph Bruls, Eindhoven, NL;

Erik Roelof Loopstra, Eindhoven, NL;

Johannes Hubertus Josephina Moors, Helmond, NL;

Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;

Wilbert Jan Mestrom, Roermond, NL;

Inventors:
Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); B08B 3/08 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70908 (2013.01); B08B 3/08 (2013.01); G03F 7/708 (2013.01); G03F 7/70033 (2013.01); G03F 7/70916 (2013.01); G03F 7/70925 (2013.01);
Abstract

A radiation source generates extreme ultraviolet radiation for a lithographic apparatus as a chamber that is provided with a low pressure hydrogen environment. A trace amount of a protective compound, e.g., HO, HO, O, NHor NO, is provided to the chamber to assist in maintaining a protective oxide film on metal, e.g., titanium, components in the chamber.


Find Patent Forward Citations

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Kempen, Antonius Theodorus Wilhelmus. (2015). Radiation source, lithographic apparatus and device manufacturing method (U.S. Patent No. 9164403). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9164403

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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