The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2015
Filed:
Mar. 14, 2013
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Kenneth S. Collins, San Jose, CA (US);
Satoru Kobayashi, Santa Clara, CA (US);
Lawrence Wong, Fremont, CA (US);
Jonathan Liu, Sunnyvale, CA (US);
Yang Yang, Sunnyvale, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Shahid Rauf, Pleasanton, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05H 1/46 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H05H 1/46 (2013.01); H01J 37/321 (2013.01); H01J 37/32174 (2013.01); H05H 2001/4682 (2013.01);
Abstract
Plasma distribution is controlled in a plasma reactor by controlling the phase differences between different RF coil antennas, in accordance with a desired or user-selected phase difference, by a phase-lock feedback control loop.