The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 2015
Filed:
Jan. 20, 2014
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Anthony Graupera, Hillsboro, OR (US);
Sean Kellogg, Portland, OR (US);
Mark W. Utlaut, Scappoose, OR (US);
N. William Parker, Hillsboro, OR (US);
Assignee:
FEI Company, Hillsboro, OR (US);
Primary Examiner:
Int. Cl.
CPC ...
H01J 27/00 (2006.01); H01J 37/30 (2006.01); H01J 37/08 (2006.01); H01J 37/18 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3002 (2013.01); H01J 37/08 (2013.01); H01J 37/18 (2013.01); H01J 2237/006 (2013.01); H01J 2237/08 (2013.01); H01J 2237/0827 (2013.01);
Abstract
An openable gas passage provides for rapid pumpout of process or bake out gases in an inductively coupled plasma source in a charged particle beam system. A valve, typically positioned in the source electrode or part of the gas inlet, increases the gas conductance when opened to pump out the plasma chamber and closes during operation of the plasma source.