The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 06, 2015

Filed:

Jul. 25, 2008
Applicants:

Lin Zhou, Eagan, MN (US);

Huiwen Liu, Eden Prairie, MN (US);

Dale Egbert, Deephaven, MN (US);

Jonathan A. Nelson, Maple Grove, MN (US);

Jianxin Zhu, Eagan, MN (US);

Inventors:

Lin Zhou, Eagan, MN (US);

Huiwen Liu, Eden Prairie, MN (US);

Dale Egbert, Deephaven, MN (US);

Jonathan A. Nelson, Maple Grove, MN (US);

Jianxin Zhu, Eagan, MN (US);

Assignee:

Seagate Technology LLC, Cupertino, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 7/34 (2006.01); B82Y 35/00 (2011.01); G01Q 30/06 (2010.01); G01Q 40/00 (2010.01);
U.S. Cl.
CPC ...
B82Y 35/00 (2013.01); G01Q 30/06 (2013.01); G01Q 40/00 (2013.01);
Abstract

A topographic profile of a structure is generated using atomic force microscopy. The structure is scanned such that an area of interest of the structure is scanned at a higher resolution than portions of the structure outside of the area of interest. An profile of the structure is then generated based on the scan. To correct skew and tilt of the profile, a first feature of the profile is aligned with a first axis of a coordinate system. The profile is then manipulated to align a second feature of the profile with a second axis of the coordinate system.


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