logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9147742 B1

PDFFull Text
Date of Patent:
Sep. 29, 2015

Filed:

Jan. 21, 2011

Heat treatment apparatus and semiconductor device manufacturing method

Applicants:

Hiroshi Doi, Chofu, JP;

Masami Shibagaki, Fuchu, JP;

Yuichi Sasuga, Minamitsuru-gun, JP;

Inventors:

Hiroshi Doi, Chofu, JP;

Masami Shibagaki, Fuchu, JP;

Yuichi Sasuga, Minamitsuru-gun, JP;

Assignee:

CANON ANELVA CORPORATION, Kawasaki-shi, JP;

Attorney:

Fitzpatrick, Cella, Harper & Scinto

Primary Examiner:

Steven B McAllister

Assistant Examiner:

Steven Anderson, II

Int. Cl.
CPC ...
H01L 21/26 (2006.01); F27D 15/02 (2006.01); H01L 29/66 (2006.01); H01L 21/04 (2006.01); H01L 21/67 (2006.01); H01L 29/16 (2006.01);
U.S. Cl.
CPC ...
H01L 29/6606 (2013.01); H01L 21/046 (2013.01); H01L 21/67109 (2013.01); H01L 21/67115 (2013.01); H01L 29/1608 (2013.01);
Abstract

A heat treatment apparatus including a vacuum vessel, a substrate stage which holds a substrate mounted on it, a heating unit for heating the substrate, and an exhaust unit for evacuating the vacuum vessel includes a first reflector which covers the upper portion of the exhaust port of the exhaust unit while being spaced apart from the exhaust port, and a second reflector which surrounds the exhaust port. At least one of reflector members which form the second reflector faces a direction defined from the heating unit to the exhaust port.

Find Patent Forward Citations

Doi, Hiroshi. (2015). Heat treatment apparatus and semiconductor device manufacturing method (U.S. Patent No. 9147742). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9147742

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…