The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 2015
Filed:
Dec. 03, 2012
Applicant:
Advanced Ion Beam Technology, Inc., Hsinchu, TW;
Inventors:
Assignee:
ADVANCED ION BEAM TECHNOLOGY, INC., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 27/00 (2006.01); H01J 27/02 (2006.01); H01J 37/08 (2006.01);
U.S. Cl.
CPC ...
H01J 27/022 (2013.01); H01J 37/08 (2013.01); H01J 2237/006 (2013.01); H01J 2237/082 (2013.01); Y10T 137/0329 (2015.04);
Abstract
A gas mixture method and apparatus of prolonging lifetime of an ion source for generating an ion beam particularly an ion beam containing carbon is proposed here. By mixing the dopant gas and the minor gas together to generate an ion beam, undesired reaction between the gas species and the ion source can be mitigated and thus lifetime of the ion source can be prolonged. Accordingly, quality of ion beam can be maintained.