The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2015

Filed:

Nov. 18, 2011
Applicants:

David L. Adler, San Jose, CA (US);

Wenbing Yun, Walnut Creek, CA (US);

Thomas Anthony Case, Walnut Creek, CA (US);

Inventors:

David L. Adler, San Jose, CA (US);

Wenbing Yun, Walnut Creek, CA (US);

Thomas Anthony Case, Walnut Creek, CA (US);

Assignee:

Carl Zeiss X-ray Microscopy, Inc., Pleasanton, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 35/14 (2006.01); H01J 35/08 (2006.01); H05G 1/52 (2006.01);
U.S. Cl.
CPC ...
H01J 35/08 (2013.01); H01J 35/14 (2013.01); H05G 1/52 (2013.01); H01J 2235/087 (2013.01); H01J 2235/186 (2013.01);
Abstract

An x-ray source is described. During operation of the x-ray source, an electron source emits a beam of electrons. This beam of electrons is focused to a spot on a target by a magnetic focusing lens. In particular, the magnetic focusing lens includes an immersion lens in which a peak in a magnitude of an associated magnetic field occurs proximate to a plane of the target. Moreover, in response to receiving the beam of focused electrons, the target provides a transmission source of x-rays.


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