The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2015

Filed:

Mar. 23, 2012
Applicants:

Johannes Petrus Martinus Bernardus Vermeulen, Helmond, NL;

Johannes Antonius Gerardus Akkermans, Eindhoven, NL;

Marinus Maria Johannes Van DE Wal, Olrschot, NL;

Ruud Antonius Catharina Maria Beerens, Roggel, NL;

Yang-shan Huang, Veldhoven, NL;

Wilhelmus Henricus Theodorus Maria Aangenent, 's-Hertogenbosch, NL;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/68 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7085 (2013.01); G03F 7/70783 (2013.01);
Abstract

A lithographic apparatus includes: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a deformation sensor to determine deformations of an object of the lithographic apparatus, wherein the deformation sensor includes at least one optical fiber arranged on or in the object, the optical fiber including one or more Bragg gratings, and an interrogation system to interrogate the one or more Bragg gratings.


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