The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 22, 2015

Filed:

Sep. 09, 2013
Applicant:

Nova Measuring Instruments Ltd., Rehovot, IL;

Inventor:

David Scheiner, Ganei Yehuda, IL;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01); G01B 11/22 (2006.01); G01B 11/24 (2006.01); G01R 31/28 (2006.01); G06T 7/00 (2006.01); G01B 11/02 (2006.01); G01B 11/08 (2006.01); G01B 11/12 (2006.01); G01R 31/311 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01B 11/00 (2013.01); G01B 11/02 (2013.01); G01B 11/08 (2013.01); G01B 11/12 (2013.01); G01B 11/22 (2013.01); G01B 11/24 (2013.01); G01R 31/2853 (2013.01); G06T 7/0004 (2013.01); G01B 2210/56 (2013.01); G01R 31/311 (2013.01); G06T 2207/30148 (2013.01); H01L 22/12 (2013.01); H01L 2924/0002 (2013.01);
Abstract

Obtaining at least one of a cross-section profile, depth, width, slope, undercut and other parameters of via-holes by a non-destructive technique using an optical system having an illumination system for producing at least one light beam and directing it on a sample in a region of the structure containing at least one via-hole, a detection system configured and operable to collect a pattern of light reflected from the illuminated region, the light pattern being indicative of one or more parameters of said via-hole, and, a control system connected to the detection system, the control system comprising a memory utility for storing a predetermined theoretical model comprising data representative of a set of parameters describing via-holes reflected pattern, and a data processing and analyzing utility configured and operable to receive and analyze image data indicative of the detected light pattern and determine one or more parameters of said via-hole.


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