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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9127362 B1

PDFFull Text
Date of Patent:
Sep. 08, 2015

Filed:

Oct. 27, 2006

Process kit and target for substrate processing chamber

Applicants:

Kathleen Scheible, San Francisco, CA (US);

Michael Allen Flanigan, Dutch Flat, CA (US);

Goichi Yoshidome, Emeryville, CA (US);

Adolph Miller Allen, Oakland, CA (US);

Cristopher M. Pavloff, San Francisco, CA (US);

Inventors:

Kathleen Scheible, San Francisco, CA (US);

Michael Allen Flanigan, Dutch Flat, CA (US);

Goichi Yoshidome, Emeryville, CA (US);

Adolph Miller Allen, Oakland, CA (US);

Cristopher M. Pavloff, San Francisco, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorneys:

Ashok K. Janah

Janah & Associates, PC

Primary Examiner:

Parviz Hassanzadeh

Assistant Examiner:

Nathan K Ford

Int. Cl.
CPC ...
C23C 14/00 (2006.01); C23C 14/50 (2006.01); H01L 21/687 (2006.01); C23C 14/34 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/50 (2013.01); C23C 14/3407 (2013.01); H01J 37/34 (2013.01); H01J 37/3441 (2013.01); H01J 37/3447 (2013.01); H01L 21/68735 (2013.01);
Abstract

A process kit comprises a ring assembly that is placed about a substrate support in a substrate processing chamber to reduce deposition of process deposits on the chamber components and on an overhang edge of the substrate. The process kit includes a deposition ring, cover ring, and anti-lift bracket, and can also include a unitary shield. A target is also described.

Published as:
KR20070046765A; US2007102286A1; DE102006051443A1; JP2007146290A; TW200730645A; CN101089220A; CN101089220B; CN103147049A; KR20130062955A; KR101322342B1; TWI435941B; KR101394085B1; CN103147049B; US9127362B2; US2015380223A1; US10347475B2; US2019267220A1; US11658016B2;

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Scheible, Kathleen. (2015). Process kit and target for substrate processing chamber (U.S. Patent No. 9127362). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9127362

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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