The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 2015

Filed:

Apr. 30, 2012
Applicants:

Wenbin Hong, Ballwin, MO (US);

Tony D. Flaim, St. James, MO (US);

Rama Puligadda, Rolla, MO (US);

Susan Bailey, Rolla, MO (US);

Inventors:

Wenbin Hong, Ballwin, MO (US);

Tony D. Flaim, St. James, MO (US);

Rama Puligadda, Rolla, MO (US);

Susan Bailey, Rolla, MO (US);

Assignee:

Brewer Science Inc., Rolla, MO (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); B31B 1/60 (2006.01); C08G 73/02 (2006.01); H01L 21/683 (2006.01); H01L 21/20 (2006.01); C09J 5/00 (2006.01); B32B 15/08 (2006.01);
U.S. Cl.
CPC ...
C08G 73/0233 (2013.01); C09J 5/00 (2013.01); H01L 21/2007 (2013.01); H01L 21/6835 (2013.01); H01L 21/6836 (2013.01); B32B 15/08 (2013.01); C09J 2203/326 (2013.01); C09J 2205/302 (2013.01); H01L 2221/6834 (2013.01); H01L 2221/68318 (2013.01); H01L 2221/68327 (2013.01); H01L 2221/68381 (2013.01); H01L 2221/68386 (2013.01); Y10T 156/10 (2015.01); Y10T 428/31515 (2015.04); Y10T 428/31551 (2015.04); Y10T 428/31725 (2015.04); Y10T 428/31786 (2015.04);
Abstract

New compositions and methods of using those compositions as bonding compositions for temporary wafer bonding are provided. The compositions are used to temporarily bond an active wafer to a carrier wafer or substrate in microelectronic fabrication using an in situ polymerization reaction of the components of the bonding composition to yield the bonding layer. The compositions form polymerized bonding layers that are mechanically strong and thermally resistant, but allow the wafers to be separated at the appropriate stage in the fabrication process. The bonding layer also retains its solubility so that residue can be cleaned from the debonded wafers using simple wet methods rather than etching or other harsh treatments.


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