The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 01, 2015
Filed:
Sep. 13, 2012
Hidenori Takahashi, Haibara-gun, JP;
Shuhei Yamaguchi, Haibara-gun, JP;
Shohei Kataoka, Haibara-gun, JP;
Michihiro Shirakawa, Haibara-gun, JP;
Fumihiro Yoshino, Haibara-gun, JP;
Shoichi Saitoh, Haibara-gun, JP;
Hidenori Takahashi, Haibara-gun, JP;
Shuhei Yamaguchi, Haibara-gun, JP;
Shohei Kataoka, Haibara-gun, JP;
Michihiro Shirakawa, Haibara-gun, JP;
Fumihiro Yoshino, Haibara-gun, JP;
Shoichi Saitoh, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
The pattern forming method of the invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit (a) represented by the following general formula (I), a compound (B) capable of generating an organic acid upon irradiation with actinic rays or radiation, and a nitrogen-containing organic compound (NA) having a group capable of leaving by the action of an acid, (ii) exposing the film, and (iii) developing the film after the exposure using a developer including an organic solvent to form a negative type pattern,