The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 2015

Filed:

Jun. 25, 2013
Applicant:

Nuflare Technology, Inc, Numazu-shi, Shizuoka, JP;

Inventors:

Hiromu Inoue, Kanagawa, JP;

Nobutaka Kikuiri, Tokyo, JP;

Assignee:

NUFLARE TECHNOLOGY, INC, Shizuoka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/24 (2006.01); G01N 21/956 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G01N 21/956 (2013.01); G01B 11/24 (2013.01); G01N 21/9501 (2013.01); G01N 21/95607 (2013.01); G01N 21/9505 (2013.01);
Abstract

A sample, which has a mesa portion having a pattern thereon, is placed on a Z table. Light is irradiated to the mesa portion through an optical system and light reflected by the mesa portion is received to measure a height of the mesa portion. A height map of the mesa portion is created based on a height of a corner position. A height using the height map is corrected based on a deviation of a measured value from a target value, and a temporal variation of a focal position of light irradiated to the mesa portion. An optical image of the pattern is obtained based on the corrected height of the mesa portion. The optical image is compared with a reference image and a defect is determined when a difference value between the optical image and the reference image is more than a predetermined threshold value.


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