The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2015
Filed:
Dec. 04, 2013
Nanometrics Incorporated, Milpitas, CA (US);
Zhuan Liu, Fremont, CA (US);
Shifang Li, Pleasanton, CA (US);
Nanometrics Incorporated, Milpitas, CA (US);
Abstract
An optical metrology device simultaneously detects light with multiple angles of incidence (AOI) and/or multiple azimuth angles to determine at least one parameter of a sample. The metrology device focuses light on the sample using an optical system with a large numerical aperture, e.g., 0.2 to 0.9. Multiple channels having multiple AOIs and/or multiple azimuth angles are selected simultaneously by passing light reflected from the sample through a plurality of pupils in a pupil plate. Beamlets produced by the plurality of pupils are detected, e.g., with one or more spectrophotometers, to produce data for the multiple AOIs and/or multiple azimuth angles. The data for multiple AOI and/or multiple azimuth angles may then be processed to determine at least one parameter of the sample, such as profile parameters or overlay error.