The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2015
Filed:
Sep. 30, 2011
Jianping Zhao, Austin, TX (US);
Lee Chen, Cedar Creek, TX (US);
Merritt Funk, Austin, TX (US);
Toshihiko Iwao, Tokyo, JP;
Peter L.g. Ventzek, Austin, TX (US);
Jianping Zhao, Austin, TX (US);
Lee Chen, Cedar Creek, TX (US);
Merritt Funk, Austin, TX (US);
Toshihiko Iwao, Tokyo, JP;
Peter L.G. Ventzek, Austin, TX (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
The invention provides a plurality of resonator subsystems. The resonator subsystems can comprise one or more resonant cavities configured to couple electromagnetic (EM) energy in a desired EM wave mode to plasma by generating resonant microwave energy in a resonant cavity adjacent the plasma. The resonator subsystem can be coupled to a process chamber using one or more interface subsystems and can comprise one or more resonant cavities, and each resonant cavity can have a plurality of plasma tuning rods coupled thereto. Some of the plasma tuning rods can be configured to couple the EM-energy from one or more of the resonant cavities to the process space within the process chamber.