The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2015

Filed:

Mar. 15, 2013
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Leonid Dorf, San Jose, CA (US);

Shahid Rauf, Pleasanton, CA (US);

Jonathan Liu, Sunnyvale, CA (US);

Jason A. Kenney, Sunnyvale, CA (US);

Andrew Nguyen, San Jose, CA (US);

Kenneth S. Collins, San Jose, CA (US);

Kartik Ramaswamy, San Jose, CA (US);

Steven Lane, Porterville, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 7/24 (2006.01); H05B 31/26 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32082 (2013.01); H01J 37/32183 (2013.01);
Abstract

An inductively coupled plasma reactor has three concentric RF coil antennas and a current divider circuit individually controlling currents in each of the three coil antennas by varying only two reactive elements in the current divider circuit.


Find Patent Forward Citations

Dorf, Leonid. (2015). Three-coil inductively coupled plasma source with individually controlled coil currents from a single rf power generator (U.S. Patent No. 9111722). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9111722

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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