The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2015

Filed:

Sep. 13, 2012
Applicants:

Toshihiro Morisawa, Yokohama, JP;

Daisuke Shiraishi, Hikari, JP;

Satomi Inoue, Kudamatsu, JP;

Akira Kagoshima, Kudamatsu, JP;

Inventors:

Toshihiro Morisawa, Yokohama, JP;

Daisuke Shiraishi, Hikari, JP;

Satomi Inoue, Kudamatsu, JP;

Akira Kagoshima, Kudamatsu, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05B 19/18 (2006.01); G05B 19/418 (2006.01);
U.S. Cl.
CPC ...
G05B 19/4184 (2013.01); G05B 2219/32191 (2013.01); G05B 2219/45031 (2013.01);
Abstract

Semiconductor manufacturing equipment includes: a controller controlling driving and processes of various parts of the semiconductor manufacturing equipment, and a sensor monitoring each physical amount in the semiconductor manufacturing equipment or a status of each chemical response amount; a database; and an arithmetic section executing: processing of reading out equipment data, calculating a correlation matrix between time points based on a plurality of pieces of signal data to be compared, calculating eigen values and eigen vectors from the correlation matrix, and calculating principal component scores by principal component analysis; processing of comparing magnitudes of the eigen values of the principal components, arranging the eigen values in descending order to display a list thereof; and processing of displaying a scatter diagram where the principal component scores of the respective signals are plotted in a feature space selecting the principal component corresponding to the eigen value having a contribution ratio.


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