The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2015
Filed:
Jan. 21, 2011
Seiko Omori, Delmar, NY (US);
Junichi Tanaka, Hachioji, JP;
Yoshinori Nakayama, Sayama, JP;
Keiichiro Hitomi, Delmar, NY (US);
Seiko Omori, Delmar, NY (US);
Junichi Tanaka, Hachioji, JP;
Yoshinori Nakayama, Sayama, JP;
Keiichiro Hitomi, Delmar, NY (US);
HITACHI HIGH-TECHNOLOGIES CORPORATION, Tokyo, JP;
Abstract
Disclosed is a scanning electron microscope provided with a calculation device () for measuring the dimension of a pattern on a sample (), characterized in that the amount of change of a pattern shape, caused by electron beam irradiation, is calculated and stored, and a pattern shape contour () before the sample is irradiated with an electron beam is restored from a pattern shape contour () in a scanning electron microscope image () after the sample is irradiated with an electron beam using the calculated amount and, then, the pattern shape contour () is displayed. Thus, the shrinking of a resist and/or the effect of electrostatic charge caused when a sample is irradiated with an electron beam are eliminated, so that the shape contour of a two-dimensional pattern before irradiating an electron beam can be restored with a high degree of accuracy, and the dimension of a pattern can be measured with a high degree of accuracy, using the restored image.