The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2015

Filed:

Feb. 08, 2012
Applicants:

Joel Seligson, D.N. Misgav, IL;

Noam Sapiens, Bat Yam, IL;

Daniel Kandel, Aseret, IL;

Inventors:

Joel Seligson, D.N. Misgav, IL;

Noam Sapiens, Bat Yam, IL;

Daniel Kandel, Aseret, IL;

Assignee:

KLA-Tencor Corporation, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/14 (2006.01); G03F 7/20 (2006.01); G01B 11/02 (2006.01); G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G01B 11/02 (2013.01); G01N 21/00 (2013.01);
Abstract

Contrast enhancement in a metrology tool may include generating a beam of illumination, directing a portion of the generated beam onto a surface of a spatial light modulator (SLM), directing at least a portion of the generated beam incident on the surface of the SLM through an aperture of an aperture stop and onto one or more target structures of one or more samples, and generating a selected illumination pupil function of the illumination transmitted through the aperture utilizing the SLM in order to establish a contrast level of one or more field images of the one or more target structures above a selected contrast threshold, and performing one or more metrology measurements on the one or more target structures utilizing the selected illumination pupil function.


Find Patent Forward Citations

Loading…