The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 11, 2015
Filed:
Sep. 25, 2012
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Johannes Rau, Gerstetten, DE;
Armin Schoeppach, Aalen, DE;
Bernhard Gellrich, Aalen, DE;
Jens Kugler, Aalen, DE;
Martin Mahlmann, Heidenheim, DE;
Bernhard Geuppert, Aalen, DE;
Thomas Petasch, Aalen, DE;
Gerhard Fuerter, Ellwangen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An optical projection system for a microlithography system includes a light path, a first lens unit receiving a first part of the light path, a second lens unit receiving a second part of the light path, and a support unit supporting the first and second lens units. The first and second lens units are elongated lens units including a plurality of lenses. The support unit includes a housing receiving a third part of the light path and enclosing a reflective element. The housing includes first and second interfaces. The first interface is a first support interface supporting the first lens unit. The second interface is a second support interface supporting the second lens unit at a location substantially opposite to the first interface.