The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2015
Filed:
Oct. 22, 2010
Toshie Yaguchi, Omitama, JP;
Yasuhira Nagakubo, Hitachinaka, JP;
Junzo Azuma, Hitachiota, JP;
Akira Watabe, Higashiibaraki, JP;
Toshie Yaguchi, Omitama, JP;
Yasuhira Nagakubo, Hitachinaka, JP;
Junzo Azuma, Hitachiota, JP;
Akira Watabe, Higashiibaraki, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
Disclosed is a charged particle radiation apparatus capable of capturing a change in a sample due to gaseous atmosphere, light irradiation, heating or the like without exposing the sample to atmosphere. The present invention relates to a sample holder provided with a sample stage that is rotatable around a rotation axis perpendicular to an electron beam irradiation direction, the sample holder being capable of forming an airtight chamber around the sample stage. A sample is allowed to chemically react in any atmosphere, and three-dimensional analysis on the reaction is enabled. A sample liable to change in atmosphere can be three-dimensionally analyzed without exposing the sample to the atmosphere.