Integrated circuits with laterally diffused metal oxide semiconductor structures

Abstract

Integrated circuits with improved LDMOS structures are provided. An integrated circuit includes a semiconductor substrate, a plurality of shallow trench isolation (STI) regions, each extending at least a first depth below an upper surface of the semiconductor substrate. The STI regions electrically isolate devices fabricated in the semiconductor substrate. The integrated circuit further includes a transistor structure. The transistor structure includes a gate dielectric positioned over a portion of a first one of the plurality of STI regions, a drain region adjacent to the first one of the plurality of STI regions and spaced apart from the gate dielectric, a first gate electrode that extends over a first portion of the gate dielectric, a second gate electrode that extends over a second portion of the gate dielectric and positioned adjacent to the first gate electrode, and a source region positioned adjacent to the first portion of the gate dielectric.