The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2015
Filed:
Sep. 14, 2011
Mitsunori Ohata, Nirasaki, JP;
Hidetoshi Kimura, Nirasaki, JP;
Kiyoshi Maeda, Kurokawa, JP;
Jun Hirose, Kurokawa, JP;
Tsuyoshi Hida, Nirasaki, JP;
Mitsunori Ohata, Nirasaki, JP;
Hidetoshi Kimura, Nirasaki, JP;
Kiyoshi Maeda, Kurokawa, JP;
Jun Hirose, Kurokawa, JP;
Tsuyoshi Hida, Nirasaki, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
There is provided a plasma processing apparatus including a susceptor, having a substrate mounting portion for mounting thereon a substrate, to which a high frequency power is applied; a focus ring, disposed to surround the substrate mounted on the substrate mounting portion, including an outer ringhaving a top surface higher than a top surface of the substrate and an inner ringextending inwardly from the outer ring so as to allow at least a part of the inner ring to be positioned below a periphery of the substrate, the outer ring and the inner ring being formed as a single member; a dielectric ringpositioned between the focus ring and the susceptor; a dielectric constant varying devicefor varying a dielectric constant of the dielectric ring.