The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 07, 2015

Filed:

Apr. 18, 2014
Applicant:

Nuflare Technology, Inc., Numazu-shi, JP;

Inventors:

Ryoichi Yoshikawa, Kanagawa, JP;

Munehiro Ogasawara, Kanagawa, JP;

Assignee:

NuFlare Technology, Inc., Numazu-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01J 37/302 (2006.01); G21K 5/04 (2006.01); G21K 5/10 (2006.01); H01J 37/317 (2006.01); H01J 37/304 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G21K 5/04 (2013.01); G03F 7/2059 (2013.01); G21K 5/10 (2013.01); H01J 37/3177 (2013.01); H01J 37/304 (2013.01); H01J 2237/24507 (2013.01); G03F 7/2065 (2013.01); H01J 37/302 (2013.01); Y10S 430/143 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01);
Abstract

A multi charged particle beam writing apparatus according to an embodiment, includes a setting unit to set a second region such that more openings in remaining openings except for an opening through which the defective beam passes are included in the second region, a selection unit to select a mode from a first mode in which a pattern is written on a target object by using multiple beams having passed openings in the second region and a second mode in which multiple writing is performed while shifting a position by using at least one of remaining multiple beams in the state where the defective beam is controlled to be beam off and additional writing is performed for a position which was supposed to be written by the defective beam, and a writing processing control unit to control to write in the mode selected.


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