The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2015
Filed:
Jan. 20, 2012
Masahiko Yasuda, Itabashi-ku, JP;
Takahiro Masada, Fukaya, JP;
Yuho Kanaya, Kumagaya, JP;
Tadashi Nagayama, Toshima-ku, JP;
Masahiko Yasuda, Itabashi-ku, JP;
Takahiro Masada, Fukaya, JP;
Yuho Kanaya, Kumagaya, JP;
Tadashi Nagayama, Toshima-ku, JP;
NIKON CORPORATION, Tokyo, JP;
Abstract
A liquid immersion exposure apparatus includes a projection system having a last optical element, the projection system projecting a beam onto a substrate through an immersion liquid; a movable stage having a holder by which the substrate is held; a measurement member provided on the movable stage, the measurement member having a measurement portion covered with a light-transmissive material; a first alignment system by which an alignment mark is detected not through the immersion liquid; and a second alignment system which optically obtains, using the measurement member, first positional information of the beam projected by the projection system through the immersion liquid. In order to obtain the first positional information, the movable stage is moved so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.