The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2015
Filed:
Jun. 01, 2012
Marc Kirch, Wedel, DE;
Martin Endres, Koenigsbronn, DE;
Damian Fiolka, Oberkochen, DE;
Joachim Hartjes, Aalen, DE;
Marc Kirch, Wedel, DE;
Martin Endres, Koenigsbronn, DE;
Damian Fiolka, Oberkochen, DE;
Joachim Hartjes, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An optical element for use in an illumination optical unit of an EUV microlithography projection exposure apparatus includes a plurality of reflective facet elements. Each reflective facet element has at least one reflective surface. In this case, at least one facet element is arranged in a manner rotatable about a rotation axis. The rotation axis intersects the at least one reflective surface of the facet element. With such an optical element, it is possible to alter the direction and/or the intensity of at least part of the illumination radiation within the illumination optical unit in a simple manner.