The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2015

Filed:

Apr. 04, 2012
Applicants:

Takehiro Tachizaki, Tokyo, JP;

Toshihiko Nakata, Tokyo, JP;

Masahiro Watanabe, Tokyo, JP;

Inventors:

Takehiro Tachizaki, Tokyo, JP;

Toshihiko Nakata, Tokyo, JP;

Masahiro Watanabe, Tokyo, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01Q 60/06 (2010.01); G01Q 60/18 (2010.01); B82Y 20/00 (2011.01); B82Y 35/00 (2011.01); G01N 21/552 (2014.01); B82Y 15/00 (2011.01); G01Q 60/22 (2010.01); G01Q 70/12 (2010.01);
U.S. Cl.
CPC ...
G01Q 60/18 (2013.01); B82Y 20/00 (2013.01); B82Y 35/00 (2013.01); G01N 21/554 (2013.01); B82Y 15/00 (2013.01); G01Q 60/22 (2013.01); G01Q 70/12 (2013.01);
Abstract

Disclosed is a measurement method of a scanning probe microscope based upon a measurement method of a scanning probe microscope for observing a shape and an optical property of a sample by exciting near-field light, scanning relative positions of the near-field light and the sample and detecting scattered light by the sample of the near-field light and having a characteristic that the near-field light is modulated to periodically vary the relative positions of the near-field light and the sample and that a frequency of modulation applied to the near-field light and an interference signal generated at a frequency for varying the relative positions of the near-field light and the sample are selectively extracted.


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