The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2015
Filed:
Apr. 23, 2013
Applicant:
Rudolph Technologies, Inc., Flanders, NJ (US);
Inventors:
Christopher Voges, Eden Prairie, MN (US);
Ajay Pai, Crystal, MN (US);
Antony Ravi Philip, Apple Valley, MN (US);
Tuan D. Le, Porto Alegre, BR;
Assignee:
Rudolph Technologies, Inc., Flanders, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 13/02 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
F21V 13/02 (2013.01); G01N 21/9503 (2013.01);
Abstract
Wafer edge inspection approaches are disclosed wherein an imaging device captures at least one image of an edge of a wafer. The at least one image can be analyzed in order to identify an edge bead removal line. An illumination system having a diffuser can further be used in capturing images.