The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2015
Filed:
Aug. 09, 2012
Jeanne P. Bickford, Essex Junction, VT (US);
Peter A. Habitz, Hinesburg, VT (US);
Vikram Iyengar, Pittsburgh, PA (US);
Jinjun Xiong, White Plains, NY (US);
Jeanne P. Bickford, Essex Junction, VT (US);
Peter A. Habitz, Hinesburg, VT (US);
Vikram Iyengar, Pittsburgh, PA (US);
Jinjun Xiong, White Plains, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Disclosed are embodiments of a method, system and computer program product for optimizing integrated circuit product yield by re-centering the manufacturing line and, optionally, adjusting wafer-level chip dispositioning rules based on the results of post-manufacture (e.g., wafer-level or module-level) performance path testing. In the embodiments, a correlation is made between in-line parameter measurements and performance measurements acquired during the post-manufacture performance path testing. Then, based on this correlation, the manufacturing line can be re-centered. Optionally, an additional correlation is made between performance measurements acquired during wafer-level performance testing and performance measurements acquired particularly during module-level performance path testing and, based on this additional correlation, adjustments can be made to the wafer-level chip dispositioning rules to further minimize yield loss.