The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2015
Filed:
Nov. 19, 2010
Koen Van Ingen Schenau, Veldhoven, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Gosse Charles DE Vries, Veldhoven, NL;
Koen Van Ingen Schenau, Veldhoven, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Gosse Charles De Vries, Veldhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
In a lithographic apparatus, an illumination mode is set using a field mirror that includes a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. A base illumination mode is selected from a set of predetermined illumination modes and the movable facets are set to effect that mode. In order to adjust an imaging parameter, a fraction of the movable facets are set to different positions. The determination of which facets to set to different positions is based on summing the effects of setting each facet to a different position.