The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2015
Filed:
Dec. 27, 2011
Jiro Higashijima, Koshi, JP;
Nobuhiro Ogata, Koshi, JP;
Satoshi Kaneko, Koshi, JP;
Shuichi Nagamine, Koshi, JP;
Yoshihiro Kai, Koshi, JP;
Jiro Higashijima, Koshi, JP;
Nobuhiro Ogata, Koshi, JP;
Satoshi Kaneko, Koshi, JP;
Shuichi Nagamine, Koshi, JP;
Yoshihiro Kai, Koshi, JP;
Tokyo Electron Limited, Minato-Ku, JP;
Abstract
Disclosed is a liquid treatment apparatus for processing a lower surface of the substrate. The apparatus includes a first nozzle disposed below a lower surface of the substrate retained by the substrate retaining unit to eject a treatment liquid towards the lower surface of the substrate, the first nozzle having a plurality of first ejection ports, which are arrayed from a position opposing a central portion of the substrate retained by the substrate retaining unit to a position opposing a peripheral portion of the substrate retained by the substrate retaining unit. An ejecting direction of the treatment liquid ejected from the first ejection port is inclined towards a rotation direction of the substrate rotated by the rotational driving unit.