The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 02, 2015

Filed:

Aug. 28, 2014
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Anton Mauder, Kolbermoor, DE;

Franz Hirler, Isen, DE;

Hans Peter Felsl, Munich, DE;

Hans-Joachim Schulze, Taufkirchen, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/302 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/861 (2006.01); H01L 29/10 (2006.01); H01L 29/36 (2006.01); H01L 29/423 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02576 (2013.01); H01L 29/4236 (2013.01); H01L 29/6609 (2013.01); H01L 29/7803 (2013.01); H01L 29/7813 (2013.01); H01L 29/861 (2013.01); H01L 29/0626 (2013.01); H01L 29/0692 (2013.01); H01L 29/1095 (2013.01); H01L 21/302 (2013.01); H01L 29/36 (2013.01); H01L 29/66136 (2013.01);
Abstract

A method of manufacturing a semiconductor device includes forming a semiconductor diode by forming a drift region, forming a first semiconductor region of a first conductivity type in or on the drift region and electrically coupling the first semiconductor region to a first terminal via a first surface of a semiconductor body, etching a trench into the semiconductor body, and forming a channel region of a second conductivity type in the trench and electrically coupling the channel region to the first terminal via the first surface of the semiconductor body. A first side of the channel region adjoins the first semiconductor region.


Find Patent Forward Citations

Loading…