The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2015
Filed:
Mar. 07, 2012
Dirk Heinrich Ehm, Lauchheim, DE;
Stefan-wolfgang Schmidt, Aalen, DE;
Guenther Dengel, Heidenheim, DE;
Dirk Heinrich Ehm, Lauchheim, DE;
Stefan-Wolfgang Schmidt, Aalen, DE;
Guenther Dengel, Heidenheim, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An optical arrangement, in particular in a projection exposure apparatus for EUV lithography. In an aspect an optical arrangement has a housing () in which at least one optical element is arranged, and at least one subhousing () which is arranged within the housing and which surrounds at least one beam incident on the optical element in operation of the optical system, wherein the internal space of the subhousing is in communication with the external space of the subhousing by way of at least one opening, wherein provided in the region of the opening is at least one flow guide portion which deflects a flushing gas flow passing through the opening from the internal space to the external space of the subhousing, at least once in its direction.