The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2015

Filed:

Oct. 01, 2013
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Mukta G. Farooq, Hopewell Junction, NY (US);

John A. Fitzsimmons, Poughkeepsie, NY (US);

Troy L. Graves-Abe, Wappingers Falls, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05K 3/42 (2006.01); H01L 23/48 (2006.01); H01L 23/532 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H05K 3/423 (2013.01); H01L 23/481 (2013.01); H01L 23/53238 (2013.01); H01L 23/53209 (2013.01); H01L 23/53214 (2013.01); H01L 23/53242 (2013.01); H01L 23/53257 (2013.01); H01L 21/76898 (2013.01); H01L 21/76844 (2013.01); H01L 21/76846 (2013.01); H01L 21/76858 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A method including depositing an alloying layer along a sidewall of an opening and in direct contact with a seed layer, the alloying layer includes a crystalline structure that cannot serve as a seed for plating a conductive material, exposing the opening to an electroplating solution including the conductive material, the conductive material is not present in the alloying layer, applying an electrical potential to a cathode causing the conductive material to deposit from the electroplating solution onto the cathode exposed at the bottom of the opening and causing the opening to fill with the conductive material, the cathode includes an exposed portion of the seed layer and excludes the alloying layer, and forming a first intermetallic compound along an intersection between the alloying layer and the conductive material, the first intermetallic compound is formed as a precipitate within a solid solution of the alloying layer and the conductive material.


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