The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2015

Filed:

Sep. 11, 2013
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Romain Esteve, Treffen am Ossiacher See, AT;

Jens Konrath, Villach, AT;

Daniel Kueck, Villach, AT;

David Laforet, Villach, AT;

Cedric Ouvrard, Villach, AT;

Roland Rupp, Lauf, DE;

Andreas Voerckel, Villach, AT;

Wolfgang Werner, Munich, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/47 (2006.01); H01L 29/78 (2006.01); H01L 29/06 (2006.01); H01L 29/812 (2006.01); H01L 29/872 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7827 (2013.01); H01L 29/06 (2013.01); H01L 29/812 (2013.01); H01L 29/872 (2013.01);
Abstract

A semiconductor device according to an embodiment is at least partially arranged in or on a substrate and includes a recess forming a mesa, wherein the mesa extends along a direction into the substrate to a bottom plane of the recess and includes a semiconducting material of a first conductivity type, the semiconducting material of the mesa including at least locally a first doping concentration not extending further into the substrate than the bottom plane. The semiconductor device further includes an electrically conductive structure arranged at least partially along a sidewall of the mesa, the electrically conductive structure forming a Schottky or Schottky-like electrical contact with the semiconducting material of the mesa, wherein the substrate comprises the semiconducting material of the first conductivity type comprising at least locally a second doping concentration different from the first doping concentration along a projection of the mesa into the substrate.


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