The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2015
Filed:
May. 09, 2013
Chorng-ping Chang, Saratoga, CA (US);
Er-xuan Ping, Fremont, CA (US);
Judon Tony Pan, Saratoga, CA (US);
Chorng-Ping Chang, Saratoga, CA (US);
Er-Xuan Ping, Fremont, CA (US);
Judon Tony Pan, Saratoga, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of fabricating a self-aligned buried wordline in a structure which contains a self-aligned buried bit line, where the overall structure which makes up a portion of a vertical channel DRAM. The materials and processes used enable self-alignment of elements of the buried wordline during the fabrication process. In addition, the materials and processes used enable for formation of individual DRAM cells which have a buried bit line width which is 16 nm or less and a perpendicular buried wordline width which is 24 nm or less.