The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2015

Filed:

Jan. 09, 2012
Applicants:

Masaru Takeshita, Kawasaki, JP;

Hirokuni Saito, Kawasaki, JP;

Jiro Yokoya, Kawasaki, JP;

Tsuyoshi Nakamura, Kawasaki, JP;

Inventors:

Masaru Takeshita, Kawasaki, JP;

Hirokuni Saito, Kawasaki, JP;

Jiro Yokoya, Kawasaki, JP;

Tsuyoshi Nakamura, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd, Kawasaki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0048 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01);
Abstract

A resist composition containing a base component (A) which exhibits changed solubility in a developing solution under the action of acid, and an acid generator component (B) which generates acid upon exposure, dissolved in an organic solvent (S) which contains an alcohol-based solvent, wherein the base component (A) contains a copolymer (A1) that exhibits increased polarity under the action of acid, and the copolymer (A1) is a copolymer in which a structural unit (a2), which is derived from an acrylate ester in which the hydrogen atom bonded to the carbon atom on the α-position may be substituted with a substituent, and includes a lactone-containing cyclic group, is dispersed uniformly within the copolymer molecule.


Find Patent Forward Citations

Loading…