The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2015
Filed:
Nov. 08, 2010
Jie Bai, Yokohama, JP;
Kenji Nakahira, Fujisawa, JP;
Atsushi Miyamoto, Yokohama, JP;
Chie Shishido, Kawasaki, JP;
Hideyuki Kazumi, Hitachinaka, JP;
Jie Bai, Yokohama, JP;
Kenji Nakahira, Fujisawa, JP;
Atsushi Miyamoto, Yokohama, JP;
Chie Shishido, Kawasaki, JP;
Hideyuki Kazumi, Hitachinaka, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The invention relates to a technique of improving a contrast of a lower-layer pattern in a multi layer by synthesizing detected signals from a plurality of detectors by using an appropriate allocation ratio in accordance with pattern arrangement. In a charged particle beam device capable of improving image quality by using detected images obtained from a plurality of detectors and in a method of improving the image quality, a method of generating one or more output images from detected images corresponding to respective outputs of the detectors that are arranged at different locations is controlled by using information of a pattern direction, an edge strength, or others calculated from a design data or the detected image. In this manner, a detection area of the detected signals can be expanded by using the plurality of detectors, and the image quality such as the contrast can be improved by synthesizing the detected signals by using the pattern direction or the edge strength calculated from the design data or the detected images.