The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2015

Filed:

Sep. 09, 2013
Applicant:

Macronix International Co., Ltd., Hsinchu, TW;

Inventors:

Chieh-Chih Chen, Hukou Shiang, TW;

Cheng-Chi Lin, Toucheng Township, Yilan County, TW;

Shih-Chin Lien, New Taipei, TW;

Shyi-Yuan Wu, Hsinchu, TW;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/866 (2006.01); H01L 29/36 (2006.01); H01L 29/78 (2006.01); H01L 29/10 (2006.01); H01L 27/06 (2006.01); H01L 29/06 (2006.01);
U.S. Cl.
CPC ...
H01L 29/66106 (2013.01); H01L 29/866 (2013.01); H01L 29/7835 (2013.01); H01L 29/1083 (2013.01); H01L 27/0629 (2013.01); H01L 29/36 (2013.01); H01L 29/0646 (2013.01); H01L 29/0649 (2013.01);
Abstract

A semiconductor structure and a method for manufacturing the same are provided. The semiconductor structure comprises a diode. The diode comprises a first doped region, a second doped region and a third doped region. The first doped region and the third doped region have a first conductivity type. The second doped region has a second conductivity type opposite to the first conductivity type. The second doped region and the third doped region are separated from each other by the first doped region. The third doped region has a first portion and a second portion adjacent to each other. The first portion and the second portion are respectively adjacent to and away from the second doped region. A dopant concentration of the first portion is bigger than a dopant concentration of the second portion.


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