The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9017563 B1

PDF
Full Text
Expired
Date of Patent:
Apr. 28, 2015

Filed:

Jun. 20, 2012
Applicants:

Emi Ushioda, Yamaguchi, JP;

Tetsuo Imai, Yamaguchi, JP;

Inventors:

Emi Ushioda, Yamaguchi, JP;

Tetsuo Imai, Yamaguchi, JP;

Assignee:

Tokuyama Corporation, Shunan-shi, Yamaguchi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01B 13/00 (2006.01); C03C 15/00 (2006.01); C25D 5/54 (2006.01); H01L 21/30 (2006.01); C09K 13/00 (2006.01); C23G 1/10 (2006.01); C23C 22/52 (2006.01); C23C 22/63 (2006.01); C23G 1/20 (2006.01); C23C 18/18 (2006.01); C23C 18/12 (2006.01); C23C 18/16 (2006.01); H05K 3/24 (2006.01); H05K 1/03 (2006.01); H05K 3/12 (2006.01);
U.S. Cl.
CPC ...
C23G 1/103 (2013.01); C23C 22/52 (2013.01); C23C 22/63 (2013.01); C23G 1/20 (2013.01); C23C 18/1844 (2013.01); C23C 18/1216 (2013.01); C23C 18/1651 (2013.01); H05K 1/0306 (2013.01); H05K 3/1291 (2013.01); H05K 2203/0796 (2013.01); H05K 3/246 (2013.01);
Abstract

Provided is a plating method of a circuit substrate comprising a conductive pattern in which a metal layer containing at least silver and copper is exposed on an outer surface. The plating method comprises: step (A) of treating the circuit substrate with a first liquid agent containing an oxidizing agent; step (B) of treating the circuit substrate after the step (A) with a second liquid agent which dissolves copper oxide, and thereby removing copper oxide from the conductive pattern's surface; step (C) of treating the circuit substrate after the step (B) with a third liquid agent whose rate of dissolving silver oxide (I) at 25° C. is 1000 times or more faster than its rate of dissolving copper (0) at 25° C., and thereby removing silver oxide from the conductive pattern's surface; and step (D) of performing electroless plating on the conductive pattern of the circuit substrate after the step (C).


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