The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2015
Filed:
Sep. 25, 2012
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventor:
Dirk Juergens, Lauchheim, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03B 27/54 (2006.01); G03F 7/26 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/26 (2013.01); G03F 7/70266 (2013.01); G03F 7/70308 (2013.01); G03F 7/70341 (2013.01);
Abstract
A lithographic system includes a projection system for projecting an object field through a projection system's pupil onto an image field. The projection system includes an optical element located at the projection system's pupil. The projection system's pupil is manipulable with respect to normalized pupil heights by the optical element. Related processes are also disclosed.
Juergens, Dirk. (2015). Lithographic systems and processes of making and using same (U.S. Patent No. 9001310). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9001310
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile