The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 07, 2015

Filed:

Aug. 10, 2007
Applicants:

Mukta G. Farooq, Hopewell Junction, NY (US);

Ian D. Melville, Highland, NY (US);

Kevin S. Petrarca, Newburgh, NY (US);

Kenneth P. Rodbell, Sandy Hook, CT (US);

Inventors:

Mukta G. Farooq, Hopewell Junction, NY (US);

Ian D. Melville, Highland, NY (US);

Kevin S. Petrarca, Newburgh, NY (US);

Kenneth P. Rodbell, Sandy Hook, CT (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 23/532 (2006.01); H01L 23/556 (2006.01);
U.S. Cl.
CPC ...
H01L 23/5329 (2013.01); H01L 23/556 (2013.01); H01L 2924/0002 (2013.01); Y10S 438/958 (2013.01); Y10S 438/967 (2013.01);
Abstract

Methods of blocking ionizing radiation to reduce soft errors and resulting IC chips are disclosed. One embodiment includes forming a front end of line (FEOL) for an integrated circuit (IC) chip; and forming at least one back end of line (BEOL) dielectric layer including ionizing radiation blocking material therein. Another embodiment includes forming a front end of line (FEOL) for an integrated circuit (IC) chip; and forming an ionizing radiation blocking layer positioned in a back end of line (BEOL) of the IC chip. The ionizing radiation blocking material or layer absorbs ionizing radiation and reduces soft errors within the IC chip.


Find Patent Forward Citations

Loading…