The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2015

Filed:

Aug. 22, 2011
Applicants:

Jan Steven Christiaan Westerlaken, Heesch, NL;

Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;

Peter Paul Steijaert, Eindhoven, NL;

Franciscus Van DE Mast, Eindhoven, NL;

Gerardus Arnoldus Hendricus Franciscus Janssen, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01); G03B 27/42 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7085 (2013.01); G03F 7/70341 (2013.01); G03F 7/70775 (2013.01); G03F 7/70908 (2013.01);
Abstract

A lithographic apparatus having a first outlet to provide a thermally conditioned fluid with a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.


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