The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2015

Filed:

May. 27, 2014
Applicants:

Intermolecular Inc., San Jose, CA (US);

Kabushiki Kaisha Toshiba, Tokyo, JP;

Sandisk 3d Llc, Milpitas, CA (US);

Inventors:

Dipankar Pramanik, Saratoga, CA (US);

Tony P. Chiang, Campbell, CA (US);

Mankoo Lee, Fremont, CA (US);

Assignees:

Intermolecular, Inc., San Jose, CA (US);

Kabushiki Kaisha Toshiba, Tokyo, JP;

SanDisk 3D LLC, Milpitas, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/8605 (2006.01); H01L 45/00 (2006.01); H01L 27/24 (2006.01);
U.S. Cl.
CPC ...
H01L 45/14 (2013.01); H01L 45/08 (2013.01); H01L 45/10 (2013.01); H01L 45/12 (2013.01); H01L 45/1233 (2013.01); H01L 45/146 (2013.01); H01L 27/2409 (2013.01); H01L 27/2463 (2013.01); H01L 45/16 (2013.01);
Abstract

A resistor structure incorporated into a resistive switching memory cell or device to form memory devices with improved device performance and lifetime is provided. The resistor structure may be a two-terminal structure designed to reduce the maximum current flowing through a memory device. A method is also provided for making such memory device. The method includes depositing a resistor structure and depositing a variable resistance layer of a resistive switching memory cell of the memory device, where the resistor structure is disposed in series with the variable resistance layer to limit the switching current of the memory device. The incorporation of the resistor structure is very useful in obtaining desirable levels of device switching currents that meet the switching specification of various types of memory devices. The memory devices may be formed as part of a high-capacity nonvolatile memory integrated circuit, which can be used in various electronic devices.


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