The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2015
Filed:
Apr. 02, 2012
Sean Kellogg, Portland, OR (US);
N. William Parker, Hillsboro, OR (US);
Mark W. Utlaut, Scappoose, OR (US);
Anthony Graupera, Hillsboro, OR (US);
Sean Kellogg, Portland, OR (US);
N. William Parker, Hillsboro, OR (US);
Mark W. Utlaut, Scappoose, OR (US);
Anthony Graupera, Hillsboro, OR (US);
FEI Company, Hillsboro, OR (US);
Abstract
An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid.