The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8987095 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 24, 2015

Filed:

Aug. 19, 2011
Applicants:

Kun-yu Lee, Tainan, TW;

Liang-gi Yao, Shin Chu, TW;

Yasutoshi Okuno, Kyoto, JP;

Clement Hsingjen Wann, Carmel, NY (US);

Inventors:

Kun-Yu Lee, Tainan, TW;

Liang-Gi Yao, Shin Chu, TW;

Yasutoshi Okuno, Kyoto, JP;

Clement Hsingjen Wann, Carmel, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01); H01L 21/28 (2006.01); H01L 29/51 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 21/28185 (2013.01); H01L 21/28194 (2013.01); H01L 29/517 (2013.01); H01L 29/66545 (2013.01); H01L 29/7833 (2013.01);
Abstract

The disclosure relates to integrated circuit fabrication and, more particularly, to a semiconductor device with a high-k gate dielectric layer. An exemplary structure for a semiconductor device comprises a substrate and a gate structure disposed over the substrate. The gate structure comprises a dielectric portion and an electrode portion that is disposed over the dielectric portion, and the dielectric portion comprises a carbon-doped high-k dielectric layer on the substrate and a carbon-free high-k dielectric layer adjacent to the electrode portion.


Find Patent Forward Citations

Lee, Kun-Yu. (2015). Method of fabricating a carbon-free dielectric layer over a carbon-doped dielectric layer (U.S. Patent No. 8987095). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8987095

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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