The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2015
Filed:
Jul. 07, 2011
Nobuaki Matsuoka, Koshi, JP;
Akira Miyata, Koshi, JP;
Shinichi Hayashi, Koshi, JP;
Suguru Enokida, Koshi, JP;
Hiroshi Tomita, Koshi, JP;
Makoto Hayakawa, Koshi, JP;
Tatsuhei Yoshida, Tokyo, JP;
Nobuaki Matsuoka, Koshi, JP;
Akira Miyata, Koshi, JP;
Shinichi Hayashi, Koshi, JP;
Suguru Enokida, Koshi, JP;
Hiroshi Tomita, Koshi, JP;
Makoto Hayakawa, Koshi, JP;
Tatsuhei Yoshida, Tokyo, JP;
Tokyo Electron Limited, Minato-Ku, JP;
Abstract
In one embodiment, a coating and developing apparatus includes a processing block having two early-stage coating unit blocks, two later-stage coating unit blocks and two developing unit blocks, each unit blocks being vertically stacked on each other. The apparatus has at least two operation modes Mand Madapted for abnormality. In mode Mthe processing module that processed the abnormal substrate in the developing unit blocks is identified, and subsequent substrates are transported to the processing module or modules, of the same type as the identified processing module, other than the identified processing module. In mode M, the developing unit block that processed the abnormal substrate is identified, and subsequent substrates are transported to the developing unit block other than the identified developing unit block.