The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2015

Filed:

Sep. 25, 2012
Applicants:

Ramesh Chandrasekharan, Portland, OR (US);

Chunguang Xia, Tualatin, OR (US);

Karl F. Leeser, West Linn, OR (US);

Damien Slevin, Salem, OR (US);

Thomas G. Jewell, Tualatin, OR (US);

Inventors:

Ramesh Chandrasekharan, Portland, OR (US);

Chunguang Xia, Tualatin, OR (US);

Karl F. Leeser, West Linn, OR (US);

Damien Slevin, Salem, OR (US);

Thomas G. Jewell, Tualatin, OR (US);

Assignee:

Novellus Systems, Inc., San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F16K 1/00 (2006.01); C23C 16/455 (2006.01); F16K 27/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); C23C 16/45561 (2013.01); F16K 27/003 (2013.01);
Abstract

A point-of-use valve (POU valve) manifold is provided that allows for multiple precursors to be delivered to a semiconductor processing chamber through a common outlet. The manifold may have a plurality of precursor inlets and a purge gas inlet. The manifold may be configured such that there are zero dead legs in the manifold when the purge gas is routed through the manifold, and may provide mounting location for the POU valves that alternate sides. One or more internal flow path volumes may include elbow features.


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