The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2015
Filed:
Jun. 12, 2009
Axel Sebastiaan Lexmond, Voorschoten, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Leonard Ferdinand Gerard Geers, Valkenburg, NL;
Axel Sebastiaan Lexmond, Voorschoten, NL;
Sjoerd Nicolaas Lambertus Donders, Vught, NL;
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Leonard Ferdinand Gerard Geers, Valkenburg, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed that comprises a substrate table, a projection system, a liquid confinement structure and a thermal measurement system. The substrate table is configured to support a substrate. The projection system is configured to direct a patterned beam of radiation on to a target portion of the substrate. The liquid confinement structure is configured to at least partly confine an immersion liquid to a space between the projection system and the substrate, the substrate table, or both. The thermal measurement system comprises a thermally sensitive coating. The thermal measurement system is configured to detect the temperature of the immersion liquid in contact with the coating. Also disclosed is a thermal measurement system, a metrology system comprising the thermal measurement system and a dummy wafer for the thermal measurement system.